EPITAXIAL-GROWTH OF BODY-CENTERED-TETRAGONAL COPPER

被引：62

作者：

LI, H ^{[1
]}

WU, SC ^{[1
]}

TIAN, D ^{[1
]}

QUINN, J ^{[1
]}

LI, YS ^{[1
]}

JONA, F ^{[1
]}

MARCUS, PM ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

PHYSICAL REVIEW B | 1989年 / 40卷 / 08期

关键词：

D O I：

10.1103/PhysRevB.40.5841

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：5841 / 5844

页数：4

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