SURFACE-CHEMISTRY AND KINETICS UNDER ENERGETIC HYDROGEN INJECTION

被引:9
作者
TANABE, T
IMOTO, S
机构
[1] Osaka Univ, Dep of Nuclear, Engineering, Suita, Jpn, Osaka Univ, Dep of Nuclear Engineering, Suita, Jpn
关键词
PLASMA DEVICES - SPUTTERING;
D O I
10.1016/0022-3115(84)90450-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In-situ surface analyses by AES under hydrogen and helium ion bombardment have been carried out on Ni and Al, and the effects of temperature and residual water vapor or oxygen have been discussed. The sputtering yield of oxygen on Ni by H** plus bombardment increases with temperature suggesting reduction of oxide by implanted hydrogen, while that of carbon and oxygen on Al is hardly dependent on temperature. He** plus bombardment gives a nearly constant sputtering yield independent of temperature, and the values of carbon on Ni and Al are somewhat larger than those of oxygen. From thermodynamical consideration, it is concluded that the reduction caused by the implanted hydrogen is highly dependent on the residual gas and the temperature; nickel is reduced while aluminum is not.
引用
收藏
页码:749 / 751
页数:3
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