DESIGN AND VERIFICATION OF NEARLY IDEAL FLOW AND HEAT-TRANSFER IN A ROTATING-DISK CHEMICAL VAPOR-DEPOSITION REACTOR

被引：70

作者：

BREILAND, WG ^{[1
]}

EVANS, GH ^{[1
]}

机构：

[1] SANDIA NATL LABS,LIVERMORE,CA 94550

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1991年 / 138卷 / 06期

关键词：

D O I：

10.1149/1.2085878

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

A research chemical vapor deposition reactor design is presented for a rotating disk configuration. The reactor can be operated under conditions such that nearly ideal, one-dimensional, infinite-radius disk behavior is achieved over most of the disk surface. Boundary conditions, flow stability under both isothermal and heated-disk conditions, and gas temperatures are addressed with both one- and two-dimensional numerical fluid mechanics models. Experimental verification of the design using flow visualization and laser Raman thermometry are presented.

引用

页码：1806 / 1816

页数：11

共 28 条

[21] A PARAMETRIC INVESTIGATION OF GAAS EPITAXIAL-GROWTH UNIFORMITY IN A HIGH-SPEED, ROTATING-DISK MOCVD REACTOR [J].