EFFECT OF DOPANT ON REACTION BETWEEN POLYCRYSTALLINE SILICON AND THIN-FILM RHODIUM

被引：6

作者：

PSARAS, PA

THOMPSON, RD

TU, KN

机构：

来源：

关键词：

D O I：

10.1063/1.96180

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：250 / 252

页数：3

共 14 条

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[10]

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