DIGITAL IMPEDANCE FOR FARADAIC ANALYSIS .2. ELECTRODISSOLUTION OF CU IN HCL

被引：45

作者：

SMYRL, WH ^{[1
]}

机构：

[1] SANDIA NATL LABS,ALBUQUERQUE,NM 87185

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 07期

关键词：

D O I：

10.1149/1.2114164

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

35

引用

收藏

页码：1555 / 1562

页数：8

相关论文

共 36 条

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