EFFECTS OF SURFACE-STRUCTURE ON THE ELECTROCHEMICAL PROPERTIES OF NI METAL-COMPLEX OXIDE FILM ELECTRODE

被引：8

作者：

TANABE, H

FUKUSHIMA, S

机构：

来源：

ELECTROCHIMICA ACTA | 1984年 / 29卷 / 09期

关键词：

D O I：

10.1016/0013-4686(84)87175-3

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1173 / 1179

页数：7

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