QUANTITATIVE MEASUREMENTS WITH A X-RAY REFLECTOMETER WORKING IN THE ANGLE-RESOLVED DISPERSIVE MODE

被引：6

作者：

CHIHAB, J ^{[1
]}

NAUDON, A ^{[1
]}

机构：

[1] LAB MET PHYS,F-86022 POITIERS,FRANCE

来源：

JOURNAL DE PHYSIQUE III | 1992年 / 2卷 / 12期

关键词：

D O I：

10.1051/jp3:1992246

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A normalization procedure for reflectivity curves obtained with a new apparatus using the angle-resolved dispersive mode (J. Appl. Cryst., 1989) is described here. Simulation of spectra with the optical theory of X-rays is then possible. It allows to determine with a good accuracy the density, thickness and interfacial rugosities of layers when their thicknesses are less than about 200 nm. In order to check the normalization procedure a bulk silicon sample and a layer of evaporated nickel are analysed.

引用

页码：2291 / 2300

页数：10

共 6 条

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