RESONANT PHOTOEMISSION-STUDY OF UNI5-XCUX

被引：23

作者：

SCHNEIDER, WD

REIHL, B

MARTENSSON, N

ARKO, AJ

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

[2] ARGONNE NATL LAB,DIV MAT SCI,ARGONNE,IL 60439

来源：

PHYSICAL REVIEW B | 1982年 / 26卷 / 01期

关键词：

D O I：

10.1103/PhysRevB.26.423

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：423 / 426

页数：4

共 18 条

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[5] AN ELLIPSOIDAL MIRROR DISPLAY ANALYZER SYSTEM FOR ELECTRON-ENERGY AND ANGULAR MEASUREMENTS
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[6] FUGGLE JC, 1981, SOLID STATE COMMUN, V38, P799, DOI 10.1016/0038-1098(81)90298-2
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[J]. JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1981, 21 (04) : 285 - 363
[8] XPS STUDY OF U, UNI5, UCU5 AND UNI0.5CU4.5
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[J]. SOLID STATE COMMUNICATIONS, 1980, 33 (06) : 573 - 575
[9] BAND-STRUCTURE MEASUREMENTS AND MULTI-ELECTRON EFFECTS (SATELLITES) FOR NEARLY-FILLED D-BAND METALS - FE, CO, NI, CU, RU, AND PD
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HEIMANN, P
EASTMAN, DE
[J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (03) : 1658 - 1663
[10] 2-ELECTRON RESONANCE AT THE 3P-THRESHOLD OF CU AND NI
IWAN, M
HIMPSEL, FJ
EASTMAN, DE
[J]. PHYSICAL REVIEW LETTERS, 1979, 43 (24) : 1829 - 1832

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