HIGH-TRANSCONDUCTANCE INSULATING-GATE INP/INGAAS BURIED P-BUFFER DH-MODFETS GROWN BY MOVPE

被引:4
作者
CHEN, YK
TEMKIN, H
TANBUNEK, T
LOGAN, RA
NOTTENBURG, RN
机构
关键词
D O I
10.1109/55.31704
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:162 / 164
页数:3
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共 10 条
[1]   HIGH-SPEED OPERATION OF INP METAL-INSULATOR-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS GROWN BY CHLORIDE VAPOR-PHASE EPITAXY [J].
ANTREASYAN, A ;
GARBINSKI, PA ;
MATTERA, VD ;
TEMKIN, H ;
ABELES, JH .
APPLIED PHYSICS LETTERS, 1987, 51 (14) :1097-1099
[2]  
CHEN YK, 1987, 45TH P IEEE DEV RES
[3]   INXAL1-XAS/INP HETEROJUNCTION INSULATED GATE FIELD-EFFECT TRANSISTORS (HIGFETS) [J].
HANSON, CM ;
CHU, P ;
WIEDER, HH ;
CLAWSON, AR .
IEEE ELECTRON DEVICE LETTERS, 1987, 8 (02) :53-54
[4]   SCHOTTKY-BARRIER HEIGHT OF N-INXGA1-XAS DIODES [J].
KAJIYAMA, K ;
MIZUSHIMA, Y ;
SAKATA, S .
APPLIED PHYSICS LETTERS, 1973, 23 (08) :458-459
[5]   A STUDY OF FE-DOPANTS FOR GROWTH OF SEMIINSULATING INP BY MOCVD [J].
LONG, JA ;
RIGGS, VG ;
MACRANDER, AT ;
JOHNSTON, WD .
JOURNAL OF CRYSTAL GROWTH, 1986, 77 (1-3) :42-46
[6]   ULTRA-HIGH-SPEED DIGITAL CIRCUIT PERFORMANCE IN 0.2-MU-M GATE-LENGTH ALINAS/GAINAS HEMT TECHNOLOGY [J].
MISHRA, UK ;
JENSEN, JF ;
BROWN, AS ;
THOMPSON, MA ;
JELLOIAN, LM ;
BEAUBIEN, RS .
IEEE ELECTRON DEVICE LETTERS, 1988, 9 (09) :482-484
[7]   DOUBLE HETEROSTRUCTURE GA0.47IN0.53AS MESFETS BY MBE [J].
OHNO, H ;
BARNARD, J ;
WOOD, CEC ;
EASTMAN, LF .
ELECTRON DEVICE LETTERS, 1980, 1 (08) :154-155
[8]   HIGH-TRANSCONDUCTANCE HETEROSTRUCTURE GA0.47IN0.53AS/INP METAL-INSULATOR-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS GROWN BY CHEMICAL BEAM EPITAXY [J].
SCHUBERT, EF ;
TSANG, WT ;
FEUER, MD ;
MANKIEWICH, PM .
IEEE ELECTRON DEVICE LETTERS, 1988, 9 (03) :145-147
[9]  
TEMKIN H, IN PRESS APPL PHYS L
[10]   HIGH-PERFORMANCE INGAAS JUNCTION FIELD-EFFECT TRANSISTOR WITH P/BE CO-IMPLANTED GATE [J].
WANG, KW ;
CHENG, CL ;
LONG, J ;
MITCHAM, D .
IEEE ELECTRON DEVICE LETTERS, 1988, 9 (05) :205-207