GATE-LENGTH DEPENDENCE OF THE SPEED OF SSI CIRCUITS USING SUBMICROMETER SELECTIVELY DOPED HETEROSTRUCTURE TRANSISTOR TECHNOLOGY

被引:47
作者
SHAH, NJ [1 ]
PEI, SS [1 ]
TU, CW [1 ]
TIBERIO, RC [1 ]
机构
[1] NATL RES & RESOURCE FACIL SUBMICRON STRUCT,ITHACA,NY 14853
关键词
D O I
10.1109/T-ED.1986.22530
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:543 / 547
页数:5
相关论文
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