MAGNETIC-PROPERTIES OF THE SENDUST TA2O5 MULTILAYER THIN-FILMS

被引:2
作者
HUR, JH
PARK, NT
KWON, SI
SONG, HS
CHANG, HS
机构
[1] Materials and Devices Research Center 1st Laboratory, Samsung Advanced Institute of Technology, Kyoungki-Do, Suwon
关键词
D O I
10.1063/1.344666
中图分类号
O59 [应用物理学];
学科分类号
摘要
The Sendust multilayer thin films were fabricated to improve magnetic properties by rf magnetron sputtering. The effective permeability of the film with 50 Å of a Ta2O5 middle layer was 1800 when annealed at 500°C. The coercivity of the film was 0.5 Oe. When the middle-layer thickness was thicker than 100 Å, the result showed no magnetic improvement in permeability and coercivity.
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收藏
页码:5137 / 5138
页数:2
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