MODIFICATION OF VAPOR-DEPOSITED WO3 ELECTROCHROMIC FILMS BY OXYGEN BACKFILLING

被引：16

作者：

SUN, SS

HOLLOWAY, PH

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1983年 / 1卷 / 02期

关键词：

D O I：

10.1116/1.571924

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：529 / 533

页数：5

共 22 条

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[9] THE INFLUENCE OF METAL OVERLAYERS ON ELECTROCHROMIC BEHAVIOR OF WO3 FILMS [J].

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[10]

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