CHARACTERIZATION OF NBN FILMS AND TUNNEL-JUNCTIONS

被引:8
作者
STERN, JA
LEDUC, HG
机构
[1] Center for Space Microelectronics Technology, Jet Propulsion Laboratory, California Institute of Technology, Pasadena, CA 91109
基金
美国国家航空航天局;
关键词
D O I
10.1109/20.133891
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Properties of NbN films and NbN/MgO/NbN tunnel junctions are discussed. NbN junctions are being developed for use in high-frequency, superconductor-insulator-superconductor (SIS) quasiparticle mixers. To properly design mixer circuits, junction and film properties need to be characterized. The specific capacitance of NbN/MgO/NbN junctions has been measured as a function of the product of the normal-state resistance and the junction area (R(n)A), and it is found to vary by more than a factor of two (35-85 fF/mu-m2) over the range of R(n)A measured (1000-50-OMEGA-mu-m2). This variation is important because the specific capacitance determines the RC speed of the tunnel junction at a given R(n)A value. The magnetic penetration depth of NbN films deposited under different conditions is also measured. The magnetic penetration depth affects the design of microstrip line used in RF tuning circuits. Control of the magnetic penetration depth is necessary to fabricate reproducible tuning circuits. Additionally, the critical current uniformity for arrays of 100 junctions has been measured. Junction uniformity will affect the design of focal-plane arrays of SIS mixers. Finally, The relevance of these measurements to the design of Josephson electronics is discussed.
引用
收藏
页码:3196 / 3199
页数:4
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