INTERLAYERS FOR DIAMOND-COATED CUTTING TOOLS

被引:46
作者
KUPP, ER
DRAWL, WR
SPEAR, KE
机构
[1] The Pennsylvania State University, University Park
关键词
D O I
10.1016/0257-8972(94)90189-9
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Boron-containing chemical vapor deposition (CVD) films are being explored for use as interlayers between WC-Co substrates and CVD diamond coatings to enhance the adherence between these materials. The wear resistance and hardness of diamond coatings on tough WC-Co substrates gives an ideal coated tool material for many machining applications. CVD diamond applied directly onto WC-Co exhibits very poor adherence. Factors contributing to this problem include the solubility and diffusivity of carbon in cobalt, resulting in limited diamond nucleation and precipitation of graphite, and the large thermal expansion mismatch between WC-Co and diamond. Boron-containing films act as diffusion barriers to carbon diffusion into the cobalt and enhance chemical bonding at the coating-substrate interface. Compositional grading of the interlayer maximizes its effectiveness as an aid to adherence. The experimental results leading to these observations are discussed in this paper.
引用
收藏
页码:378 / 383
页数:6
相关论文
共 17 条
[1]   MORPHOLOGY OF CHEMICAL VAPOR-DEPOSITED TITANIUM DIBORIDE [J].
BESMANN, TM ;
SPEAR, KE .
JOURNAL OF CRYSTAL GROWTH, 1975, 31 (DEC) :60-65
[2]   ANALYSIS OF CHEMICAL VAPOR-DEPOSITION OF TITANIUM DIBORIDE .1. EQUILIBRIUM THERMODYNAMIC ANALYSIS [J].
BESMANN, TM ;
SPEAR, KE .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (05) :786-790
[3]   ANALYSIS OF CHEMICAL VAPOR-DEPOSITION OF TITANIUM DIBORIDE .2. MODELING KINETICS OF DEPOSITION [J].
BESMANN, TM ;
SPEAR, KE .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (05) :790-797
[4]   GROWTH OF DIAMOND FILMS ON STAINLESS-STEEL [J].
CHEN, H ;
NIELSEN, ML ;
GOLD, CJ ;
DILLON, RO ;
DIGREGORIO, J ;
FURTAK, T .
THIN SOLID FILMS, 1992, 212 (1-2) :169-172
[5]  
ERIKSSON G, 1993, CHEMSAGE
[6]   DIAMOND DEPOSITION ON CHROMIUM, COBALT AND NICKEL SUBSTRATES BY MICROWAVE PLASMA CHEMICAL-VAPOR-DEPOSITION [J].
HAUBNER, R ;
LINDLBAUER, A ;
LUX, B .
DIAMOND AND RELATED MATERIALS, 1993, 2 (12) :1505-1515
[7]  
HAUBNER R, 1989, J PHYS PARIS S, V5, P169
[8]   IMPROVEMENT ON ADHESION STRENGTH OF DIAMOND FILM ON CEMENTED CARBIDE BY HEATED INTERMEDIATE LAYER [J].
ISOZAKI, T ;
SAITO, Y ;
MASUDA, A ;
FUKUMOTO, K ;
CHOSA, M ;
ITO, T ;
OLES, EJ ;
INSPECTOR, A ;
BAUER, CE .
DIAMOND AND RELATED MATERIALS, 1993, 2 (08) :1156-1159
[9]   ADHESION MEASUREMENTS OF CHEMICALLY VAPOR-DEPOSITED AND PHYSICALLY VAPOR-DEPOSITED HARD COATINGS ON WC-CO SUBSTRATES [J].
JINDAL, PC ;
QUINTO, DT ;
WOLFE, GJ .
THIN SOLID FILMS, 1987, 154 (1-2) :361-375
[10]   CHARACTERIZATION OF DIAMOND FILMS BY RAMAN-SPECTROSCOPY [J].
KNIGHT, DS ;
WHITE, WB .
JOURNAL OF MATERIALS RESEARCH, 1989, 4 (02) :385-393