ANGULAR-DEPENDENCE OF X-RAY PHOTOELECTRONS

被引：47

作者：

BRUNNER, J ^{[1
]}

ZOGG, H ^{[1
]}

机构：

[1] ETH ZURICH,INST FESTKORPER PHYS,ZURICH,SWITZERLAND

来源：

关键词：

D O I：

10.1016/0368-2048(74)85060-7

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

引用

页码：911 / 920

页数：10

共 7 条

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[2] FADLEY CS, 1972, ELECTRON SPECTROSCOP, P233
[3] SURFACE SENSITIVITY AND ANGULAR DEPENDENCE OF X-RAY PHOTOELECTRON SPECTRA
FRASER, WA
FLORIO, JV
DELGASS, WN
ROBERTSON, WD
[J]. SURFACE SCIENCE, 1973, 36 (02) : 661 - 674
[4] ANGULAR DEPENDENCES IN ELECTRON-EXCITED AUGER EMISSION
HARRIS, LA
[J]. SURFACE SCIENCE, 1969, 15 (01) : 77 - &
[5] Hedman J., 1972, PHYS SCRIPTA, V5, P93, DOI [10.1088/0031-8949/5/1-2/015, DOI 10.1088/0031-8949/5/1-2/015]
[6] ULTRASOFT-X-RAY REFLECTION, REFRACTION, AND PRODUCTION OF PHOTOELECTRONS (100-1000-EV REGION)
HENKE, BL
[J]. PHYSICAL REVIEW A, 1972, 6 (01): : 94 - &
[7] ZOGG H, 1974, THESIS ETH