PHOTOELASTIC BEHAVIOR OF POLYSTYRENE AND POLY-ALPHA-METHYLSTYRENE

被引：4

作者：

RUDD, JF

机构：

来源：

JOURNAL OF POLYMER SCIENCE PART B-POLYMER LETTERS | 1966年 / 4卷 / 12PB期

关键词：

D O I：

10.1002/pol.1966.110041201

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

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页码：929 / &

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TURLEY SG, PRIVATE COMMUNICATIO