SENSITIVITY OF MANY-BEAM ELECTRON MICROSCOPE IMAGES TO FORM OF ABSORPTION AND EXTINCTION PARAMETERS

The sensitivity of electron microscope image intensity profiles to the form of the absorption and extinction parameters has been analyzed for many‐beam diffraction conditions which predominate at high voltage for most metals. The results show that the profiles are most sensitive to the extinction parameter which must be known to better than 5% if good agreement with experiment is to be obtained. It appears that the form of the absorption parameters has little influence on the intensity distributions of n‐beam profiles, especially for medium atomic number elements such as copper. Copyright © 1969 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim