NEAR-SURFACE DEFECT PROFILING WITH SLOW POSITRONS - ARGON-SPUTTERED A1(110)

被引：40

作者：

VEHANEN, A ^{[1
]}

MAKINEN, J ^{[1
]}

HAUTOJARVI, P ^{[1
]}

HUOMO, H ^{[1
]}

LAHTINEN, J ^{[1
]}

NIEMINEN, RM ^{[1
]}

VALKEALAHTI, S ^{[1
]}

机构：

[1] UNIV JYVASKYLA,DEPT PHYS,SF-40100 JYVASKYLA,FINLAND

来源：

PHYSICAL REVIEW B | 1985年 / 32卷 / 11期

关键词：

D O I：

10.1103/PhysRevB.32.7561

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：7561 / 7563

页数：3

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