MICROSTRUCTURAL EVOLUTION IN HIGH-ENERGY HELIUM IMPLANTED NICKEL .2. THERMAL ANNEALING AFTER ROOM-TEMPERATURE IMPLANTATION

被引：11

作者：

EHRHART, P

GABER, A

JAGER, W

机构：

来源：

ACTA METALLURGICA | 1987年 / 35卷 / 08期

关键词：

D O I：

10.1016/0001-6160(87)90023-X

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

引用

页码：1943 / 1950

页数：8

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