MICROWEAR OF SILICON SURFACES

被引：7

作者：

ANDOH, Y ^{[1
]}

KANEKO, R ^{[1
]}

机构：

[1] NTT ADV TECHNOL CORP, MUSASHINO, TOKYO 180, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1995年 / 34卷 / 6B期

关键词：

SCANNING SCRATCHING; AFM; DIAMOND TIP; UPHEAVAL; ACTIVATION OF SURFACE;

D O I：

10.1143/JJAP.34.3380

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A silicon surface and a diamond-like carbon film were scanning scratched in the air. The silicon surfaces scratched with a light load upheaved immediately. This upheaval represents the pre-stage of wear. The silicon surface depressed by heavier scratching began to upheaved after some time. This implies that the surface was activated by scratching and adsorbed molecules in the air.

引用

页码：3380 / 3381

页数：2