RELATIVE SENSITIVITY FACTORS AND USEFUL YIELDS FOR A MICROFOCUSED GALLIUM ION-BEAM AND TIME-OF-FLIGHT SECONDARY ION MASS-SPECTROMETER

被引:5
作者
BENNETT, J
SIMONS, D
机构
[1] Surface and Microanalvsis Science Division, National Institute of Standards and Technology, Gaithersburg
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1991年 / 9卷 / 03期
关键词
D O I
10.1116/1.577631
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Relative sensitivity factors for several elements in micrometer size glass particles, bulk glasses and glass thin films have been determined for a Ga+ liquid metal ion gun combined with a time-of-flight secondary ion mass spectrometer. The reproducibility of the values within and among glasses of various compositions is better than 20%. Reproducibility is improved by sputter cleaning the sample prior to data collection. Relative sensitivity factors have been obtained from bulk glasses using pulsed, low-energy electrons to neutralize charge buildup on the sample. Useful yields for Mg and Ca in a thin glass film were calculated to be 3.4 x 10(-4) and 8.0 x 10(-4), respectively.
引用
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页码:1379 / 1384
页数:6
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