THE EFFECT OF DEPOSITION AND PROCESSING VARIABLES ON THE OXIDE STRUCTURE OF M-CR-AL COATINGS

被引：13

作者：

SHAFFER, SJ ^{[1
]}

BOONE, DH ^{[1
]}

LAMBERTSON, RT ^{[1
]}

PEACOCK, DE ^{[1
]}

机构：

[1] NAVAL POSTGRAD SCH,DEPT MECH ENGN,MONTEREY,CA 93940

来源：

THIN SOLID FILMS | 1983年 / 107卷 / 04期

关键词：

D O I：

10.1016/0040-6090(83)90308-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：463 / 472

页数：10

共 12 条

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[3] ELECTRON-BEAM EVAPORATION OF LOW VAPOR-PRESSURE ELEMENTS IN MCRAL COATING COMPOSITIONS [J].

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SHEN, S ;

MCKOON, R .

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[4]

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[5] OXIDATION OF TD NIC (NI-20CR-2 VOL PERCENT THO2) BETWEEN 900 DEGREES AND 1200 DEGREES C [J].

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[6]

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[8]

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[9]

TALBOOM FP, 1970, NASA CR72813 CONTR R

[10] IMPROVEMENTS IN HIGH-TEMPERATURE OXIDATION RESISTANCE BY ADDITIONS OF REACTIVE ELEMENTS OR OXIDE DISPERSIONS [J].

WHITTLE, DP ;

STRINGER, J .

PHILOSOPHICAL TRANSACTIONS OF THE ROYAL SOCIETY A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES, 1980, 295 (1413) :309-+

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