EFFECTS OF SUBSTRATE MICROSTRUCTURE ON THE MAGNETIC-ANISOTROPY OF SPUTTERED COBALT ALLOY FILM

被引:4
作者
ISHIKAWA, A
OHNO, T
SAKANO, S
SHIROISHI, Y
机构
[1] Central Research Laboratory, Hitachi Ltd., Kokubunji, Tokyo
关键词
D O I
10.1016/0304-8853(93)91361-A
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The magnetic properties and crystalline structure of Co alloy film deposited on a regularly corrugated substrate have been studied. Microscopic grooves are lithographically fabricated on InP substrates. In-plane anisotropy energy is 4-5 x 10(4) J/m3. The magnetic anisotropy is affected by the crystallographic orientation and the microscopic shape of the corrugated Co alloy film.
引用
收藏
页码:357 / 361
页数:5
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