SURFACE-ANALYSIS OF GLASS IN THE ELECTRONICS INDUSTRY

[1] LOCAL IN-DEPTH ANALYSIS OF CERAMIC MATERIALS BY NEUTRAL BEAM SECONDARY ION MASS-SPECTROMETRY [J]. INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1980, 34 (3-4): : 361 - 373

[2] SECONDARY-ELECTRON EMISSION OF SEMICONDUCTING GLASSES [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1973, 56 (09) : 494 - 494

[3] FRECHETTE VD, 1974, SURFACES INTERFACES

[4] GOSSINK R, 1979, APPL PHYS LETT, V34, P44

[5] SIMS ANALYSIS OF AQUEOUS CORROSION PROFILES IN SODA-LIME-SILICA GLASS [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1979, 62 (1-2) : 4 - 9

[6] LIMITATIONS OF ION ETCHING FOR INTERFACE ANALYSIS [J]. SURFACE AND INTERFACE ANALYSIS, 1981, 3 (03) : 118 - 125

[7] HUNT C, 1981, SURF INTERF ANAL, V3, P15

[8] OXYGEN OUTGASSING CAUSED BY ELECTRON BOMBARDMENT OF GLASS [J]. JOURNAL OF APPLIED PHYSICS, 1963, 34 (06) : 1786 - &

[9] LYDTIN H, 1979, ACTA ELECTRON, V22, P225

[10] MACCAUGHAN D, 1973, PHYS REV LETT, V30, P614

[1] LOCAL IN-DEPTH ANALYSIS OF CERAMIC MATERIALS BY NEUTRAL BEAM SECONDARY ION MASS-SPECTROMETRY [J]. INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1980, 34 (3-4): : 361 - 373

[2] SECONDARY-ELECTRON EMISSION OF SEMICONDUCTING GLASSES [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1973, 56 (09) : 494 - 494

[3] FRECHETTE VD, 1974, SURFACES INTERFACES

[4] GOSSINK R, 1979, APPL PHYS LETT, V34, P44

[5] SIMS ANALYSIS OF AQUEOUS CORROSION PROFILES IN SODA-LIME-SILICA GLASS [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1979, 62 (1-2) : 4 - 9

[6] LIMITATIONS OF ION ETCHING FOR INTERFACE ANALYSIS [J]. SURFACE AND INTERFACE ANALYSIS, 1981, 3 (03) : 118 - 125

[7] HUNT C, 1981, SURF INTERF ANAL, V3, P15

[8] OXYGEN OUTGASSING CAUSED BY ELECTRON BOMBARDMENT OF GLASS [J]. JOURNAL OF APPLIED PHYSICS, 1963, 34 (06) : 1786 - &

[9] LYDTIN H, 1979, ACTA ELECTRON, V22, P225

[10] MACCAUGHAN D, 1973, PHYS REV LETT, V30, P614