KINETIC PROCESSES IN CONTINUOUSLY PULSED COPPER HALIDE LASERS

被引：26

作者：

LIU, CS ^{[1
]}

FELDMAN, DW ^{[1
]}

PACK, JL ^{[1
]}

WEAVER, LA ^{[1
]}

机构：

[1] WESTINGHOUSE ELECT CORP, RES LABS, PITTSBURGH, PA 15235 USA

来源：

关键词：

D O I：

10.1109/JQE.1977.1069645

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：744 / 751

页数：8

共 19 条

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[J]. IEEE JOURNAL OF QUANTUM ELECTRONICS, 1975, QE11 (04) : 172 - 174
[2] ARKITAVA OS, 1975, SOV J QUANTUM ELECTR, V5, P1001
[3] Bokhan P. A., 1975, Soviet Journal of Quantum Electronics, V5, P96, DOI 10.1070/QE1975v005n01ABEH010802
[4] HIGH-EFFICIENCY MULTIPLY PULSED COPPER VAPOR LASER UTILIZING COPPER CHLORIDE AS A LASANT
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[J]. APPLIED PHYSICS LETTERS, 1975, 26 (09) : 504 - 505
[5] DOUBLE-DISCHARGE COPPER VAPOR LASER WITH COPPER CHLORIDE AS A LASANT
CHEN, CJ
NERHEIM, NM
RUSSELL, GR
[J]. APPLIED PHYSICS LETTERS, 1973, 23 (09) : 514 - 515
[6] GAYDON AG, 1953, DISSOCIATION ENERGIE, P224
[7] Isaev A. A., 1973, Optics and Spectroscopy, V35, P307
[8] ISAEV AA, 1972, JETP LETT-USSR, V16, P27
[9] HIGH-REPETITION-RATE COPPER IODIDE LASER
LIBERMAN, I
BABCOCK, RV
LIU, CS
GEORGE, TV
WEAVER, LA
[J]. APPLIED PHYSICS LETTERS, 1974, 25 (06) : 334 - 335
[10] COPPER SUPERRADIANT EMISSION FROM PULSED DISCHARGES IN COPPER IODIDE VAPOR
LIU, CS
SUCOV, EW
WEAVER, LA
[J]. APPLIED PHYSICS LETTERS, 1973, 23 (02) : 92 - 93