FORMATION OF NEGATIVE-IONS BY ELECTRON-IMPACT ON SIF4 AND CF4

被引：35

作者：

IGA, I ^{[1
]}

RAO, MVVS ^{[1
]}

SRIVASTAVA, SK ^{[1
]}

NOGUEIRA, JC ^{[1
]}

机构：

[1] UNIV FED SAO CARLOS,DEPT QUIM,BR-13560 SAO CARLOS,SP,BRAZIL

来源：

ZEITSCHRIFT FUR PHYSIK D-ATOMS MOLECULES AND CLUSTERS | 1992年 / 24卷 / 02期

关键词：

34.80.Gs;

D O I：

10.1007/BF01426694

中图分类号：

O64 [物理化学（理论化学）、化学物理学]; O56 [分子物理学、原子物理学];

学科分类号：

070203 ; 070304 ; 081704 ; 1406 ;

摘要：

First measurements of cross sections for the formation of negative ions by electron attachment to SiF4 and CF4 are reported for an electron impact energy range of 0 to 50 eV. The energies at which the various ions appear and the positions at which the ionization efficiency curves peak have been obtained and compared with previous measurements. Thermochemical data have been used to predict and identify the various channels of dissociation. Cross sections for the production of ion pairs through the process of polar dissociation have also been measured.

引用

页码：111 / 115

页数：5

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