POTENTIAL DISTRIBUTION + NEGATIVE RESISTANCE IN THIN OXIDE FILMS

[1] PHOTOCONDUCTION IN ANODIC TA2O5 [J]. PHYSICAL REVIEW, 1952, 88 (01): : 58 - 59

[2] INJECTION ELECTROLUMINESCENCE IN ZNS + ZNSE [J]. JOURNAL OF APPLIED PHYSICS, 1964, 35 (3P1) : 606 - &

[3] BARRAUD A, 1963, CR HEBD ACAD SCI, V256, P3632

[4] BOER KW, 1962, FESTKORPERPROBLEME, V1, P38

[5] BUBE RH, 1960, PHOTOCONDUCTIVITY SO, P233

[6] SCHOTTKY EMISSION THROUGH THIN INSULATING FILMS [J]. PHYSICAL REVIEW LETTERS, 1962, 8 (07) : 267 - &

[7] Frenkel J, 1938, PHYS REV, V54, P647, DOI 10.1103/PhysRev.54.647

[8] Frenkel J., 1938, TECH PHYS USSR, V5, P685

[9] GEPPERT DV, AF336578721 STANF RE

[10] LOW-FREQUENCY NEGATIVE RESISTANCE IN THIN ANODIC OXIDE FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1962, 33 (09) : 2669 - &

[1] PHOTOCONDUCTION IN ANODIC TA2O5 [J]. PHYSICAL REVIEW, 1952, 88 (01): : 58 - 59

[2] INJECTION ELECTROLUMINESCENCE IN ZNS + ZNSE [J]. JOURNAL OF APPLIED PHYSICS, 1964, 35 (3P1) : 606 - &

[3] BARRAUD A, 1963, CR HEBD ACAD SCI, V256, P3632

[4] BOER KW, 1962, FESTKORPERPROBLEME, V1, P38

[5] BUBE RH, 1960, PHOTOCONDUCTIVITY SO, P233

[6] SCHOTTKY EMISSION THROUGH THIN INSULATING FILMS [J]. PHYSICAL REVIEW LETTERS, 1962, 8 (07) : 267 - &

[7] Frenkel J, 1938, PHYS REV, V54, P647, DOI 10.1103/PhysRev.54.647

[8] Frenkel J., 1938, TECH PHYS USSR, V5, P685

[9] GEPPERT DV, AF336578721 STANF RE

[10] LOW-FREQUENCY NEGATIVE RESISTANCE IN THIN ANODIC OXIDE FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1962, 33 (09) : 2669 - &