ELECTRICAL-PROPERTIES OF A-SICX/A-SI HETEROJUNCTIONS

被引:2
作者
NIEMANN, E
FISCHER, R
LEIDICH, D
LINHART, E
机构
[1] AEG-Forschungsinstitut, Frankfurt, West Ger, AEG-Forschungsinstitut, Frankfurt, West Ger
关键词
SEMICONDUCTING SILICON - Amorphous - SEMICONDUCTOR MATERIALS - Doping - SILICON CARBIDE - Amorphous;
D O I
10.1016/0022-3093(85)90827-0
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The authors have investigated the dependence of the I-V-characteristic of a-Si/a-SiC//x heterojunctions on the C- and P-content of a-SiC//x. The I-V-characteristic indicates the influence of a barrier for electrons in the case of P-doped a-SiC//x. No indication of a barrier for holes is found in the case of B-doped a-SiC//x. It is concluded, therefore, that the widening of the gap of a-SiC//x by the incorporation of C is chiefly due to a shift of the conduction band.
引用
收藏
页码:991 / 994
页数:4
相关论文
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