IMPROVED PERFORMANCE OF A DOUBLE DISCHARGE INITIATED PULSED HF CHEMICAL LASER

被引：25

作者：

VOIGNIER, F ^{[1
]}

GASTAUD, M ^{[1
]}

机构：

[1] GE CO,CTR RECH,DEPT RECH PHYS BASE,RT NOZAY,91460 MARCOUSSIS,FRANCE

来源：

关键词：

D O I：

10.1063/1.1655345

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：649 / 650

页数：2

共 8 条

[1]

ARNOLD GP, 1973, IEEE J QUANTUM ELECT, VQE 9, P491

[2] HIGH PEAK POWER GAS LASERS [J].

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PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1971, 59 (04) :667-&

DENES, LJ ;

FARISH, O .

[4]

DUMANCHIN R, 1969, CR ACAD SCI B PHYS, V269, P916

LAMBERTON, HM ;

PEARSON, PR .

[6]

MARCUS S, 1971, IEEE J QUANTUM ELECT, VQE 7, P493

[7]

MCDANIEL EW, 1964, COLLISION PHENOMENA, P362

[8] EFFECT OF AN ORGANIC GAS ADDITIVE ON A PULSE HF CHEMICAL LASER [J].

PAULSON, RF .