ELECTROCHEMICAL STUDY OF TITANIUM NITRIDE FILMS OBTAINED BY REACTIVE SPUTTERING

被引：74

作者：

MASSIANI, Y

MEDJAHED, A

GRAVIER, P

ARGEME, L

FEDRIZZI, L

机构：

[1] UNIV PROVENCE,PHYS SOLIDES LAB,F-13331 MARSEILLE,FRANCE

[2] UNIV TRENTO,DEPT ENGN,I-38050 TRENT,ITALY

来源：

THIN SOLID FILMS | 1990年 / 191卷 / 02期

关键词：

D O I：

10.1016/0040-6090(90)90382-N

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

TiN coatings were prepared by reactive sputtering on glass substrates. The production parameters were chosen in order to obtain stoichiometric TiN. The electrochemical behaviour of the samples was investigated using both d.c. and a.c. electrochemical techniques in aqueous solutions: two sulphatic and one chloric. The chemical composition of the surface was analysed by Auger electron spectroscopy before and after the polarization tests. The TiN coating exhibited a very high free corrosion potential and a small anodic current, which indicates a very low reactivity in all the considered solutions. In the anodic range a current peak occurred which corresponds to the formation of an oxidized titanium layer with semiconducting properties. © 1990.

引用

页码：305 / 316

页数：12

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