MAGNETIC DOMAINS IN THIN SPUTTERED FESI FILMS .1. EDGE EFFECTS AND INFLUENCE OF SUBSTRATE TEMPERATURE AND AR PRESSURE DURING SPUTTERING

被引：4

作者：

POCKRAND, I ^{[1
]}

VERWEEL, J ^{[1
]}

机构：

[1] PHILIPS FORSCH LAB HAMBURG GMBH,HAMBURG,FED REP GER

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1975年 / 27卷 / 02期

关键词：

D O I：

10.1002/pssa.2210270212

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：413 / 427

页数：15

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