CURVATURE DEPENDENCE OF THE INTERFACIAL-TENSION IN BINARY NUCLEATION

被引:25
作者
NISHIOKA, K [1 ]
TOMINO, H [1 ]
KUSAKA, I [1 ]
TAKAI, T [1 ]
机构
[1] KAGAWA UNIV,FAC EDUC,TAKAMATSU,KAGAWA 760,JAPAN
来源
PHYSICAL REVIEW A | 1989年 / 39卷 / 02期
关键词
D O I
10.1103/PhysRevA.39.772
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
引用
收藏
页码:772 / 782
页数:11
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