THE ETCHING MECHANISMS OF SIO2 IN HYDROFLUORIC-ACID

被引:131
作者
VERHAVERBEKE, S [1 ]
TEERLINCK, I [1 ]
VINCKIER, C [1 ]
STEVENS, G [1 ]
CARTUYVELS, R [1 ]
HEYNS, MM [1 ]
机构
[1] KATHOLIEKE UNIV LEUVEN,DEPT CHEM,B-3001 LOUVAIN,BELGIUM
关键词
D O I
10.1149/1.2059243
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The different equilibria in HF and HF/HCl solutions are examined and the etching reaction of SiO2 is investigated as a function of the different species present in the HF solution. A new model for the etching mechanism of SiO2 is developed based on the existence of the dimer of HF, (HF)2.
引用
收藏
页码:2852 / 2857
页数:6
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