PLASMA-DEPOSITED FLUOROCARBON FILMS ON SILICON STUDIED BY ELLIPSOMETRY

被引：22

作者：

OEHRLEIN, GS

REIMANIS, I

LEE, YH

机构：

来源：

THIN SOLID FILMS | 1986年 / 143卷 / 03期

关键词：

D O I：

10.1016/0040-6090(86)90180-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：269 / 278

页数：10

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