ABOUT THE FLUORINE CHEMISTRY IN MCVD - THE INFLUENCE OF FLUORINE DOPING ON SIO2 DEPOSITION

被引：13

作者：

KIRCHHOF, J

KLEINERT, P

UNGER, S

FUNKE, A

机构：

来源：

CRYSTAL RESEARCH AND TECHNOLOGY | 1986年 / 21卷 / 11期

关键词：

D O I：

10.1002/crat.2170211113

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：1437 / 1444

页数：8

共 16 条

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