SELF-DIFFUSION ON RECONSTRUCTED AND NONRECONSTRUCTED-LR SURFACES

被引:10
作者
CHEN, CL [1 ]
TSONG, TT [1 ]
机构
[1] ACAD SINICA,INST PHYS,TAIPEI 11529,TAIWAN
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1992年 / 10卷 / 04期
关键词
D O I
10.1116/1.578001
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Using the field ion microscope, we have studied random walk diffusion of single Ir atoms and small Ir atomic clusters on Ir surfaces. On the (1 X 1) Ir {001} surface, diffusion of Ir adatoms occurs by an atomic replacement mechanism along the [001] directions. On the (1 X 1) Ir {110} surface, self-diffusion occurs by atomic hopping along the [110] directions and by atomic replacement along the [001] directions. On the (1 X 2) reconstructed Ir {110} surface, self-diffusion occurs only by atomic hopping along the doubly spaced [110BAR] surface channels. Within the experimental accuracy, the pre-exponential factors are all in the 10(-3) cm2/s range. Energies needed for these atomic replacements and the barrier heights for these atomic hoppings are also derived. Diffusion of diatomic clusters on the (1 X 1) Ir {110} surfaces has also been studied.
引用
收藏
页码:2178 / 2184
页数:7
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