CHARACTERIZATION OF TIN FILMS PREPARED BY ELECTRON SHOWER, ARC ION-PLATING AND SPUTTERING METHODS

被引:3
作者
YUMOTO, H
KANEKO, K
ISHIHARA, M
AKASI, K
KANEKO, T
机构
[1] SCI UNIV TOKYO,DEPT IND & ENGN CHEM,NODA,CHIBA 278,JAPAN
[2] SCI UNIV TOKYO,DEPT APPL PHYS,SHINJUKU KU,TOKYO 162,JAPAN
来源
ADVANCED MATERIALS FOR OPTICS AND ELECTRONICS | 1995年 / 5卷 / 04期
关键词
TIN; ADHESION; PVD; ELECTRON SHOWER; ARC ION PLATING; SPUTTERING; WEAR; SURFACE MORPHOLOGY;
D O I
10.1002/amo.860050403
中图分类号
O69 [应用化学];
学科分类号
081704 ;
摘要
It has been found that TiN films with high wear resistance and high adhesion can be prepared by electron shower deposition and are ion plating on glass and austenitic stainless steel (SUS 316) substrates. The high wear resistance is principally explained by the grain size and surface morphology. Fine {100}faceted crystals (10-150 nm) grew on the surface, The typical morphology of the crystals was triangular pyramidal. The crystallite size was changed by the bias voltage, Faceted crystals produced by are ion plating were rounded and smoothed by a change in bias, but were unaltered in samples prepared by the electron shower process. The fine faceted surfaces had higher wear resistance than the granularly rounded ones. When TiO2 was formed at the interface of the glass substrate, the adhesion was lowered. The high-adhesion film prepared by electron shower deposition contained a small amount of TiO2 at the interface.
引用
收藏
页码:191 / 198
页数:8
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