INFLUENCE OF ALTERED LAYER ON DEPTH PROFILING MEASUREMENTS

被引：80

作者：

WINTERS, HF ^{[1
]}

COBURN, JW ^{[1
]}

机构：

[1] IBM CORP,RES LAB,SAN JOSE,CA 95193

来源：

APPLIED PHYSICS LETTERS | 1976年 / 28卷 / 04期

关键词：

D O I：

10.1063/1.88714

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：176 / 179

页数：4

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