THE USE OF AN LMIS AND ARGON ION SPUTTERING IN STUDIES OF THIN-FILM STRAIN-GAUGES

被引：3

作者：

TAYLOR, AG

THURSTANS, RE

OXLEY, DP

机构：

来源：

VACUUM | 1984年 / 34卷 / 1-2期

关键词：

D O I：

10.1016/0042-207X(84)90149-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：321 / 325

页数：5

共 8 条

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[3]

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[7] SIZE EFFECT IN STRAIN COEFFICIENT OF RESISTIVITY [J].

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