COMPUTER-SIMULATION OF CURRENT-DENSITY PROFILES IN FOCUSED ION-BEAMS

被引：43

作者：

WARD, JW

UTLAUT, MW

KUBENA, RL

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期

关键词：

D O I：

10.1116/1.583856

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：169 / 174

页数：6

共 9 条

[1]

Cummings K. D., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V632, P93, DOI 10.1117/12.963673

[2] USE OF MATRICES TO REPRESENT ELECTRON LENSES - MATRICES FOR 2-TUBE ELECTROSTATIC LENS [J].

DICHIO, D ;

NATALI, SV ;

KUYATT, CE ;

GALEJS, A .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1974, 45 (04) :566-569

[3] MEASUREMENT OF VIRTUAL CROSSOVER IN LIQUID GALLIUM ION-SOURCE [J].

KOMURO, M ;

KANAYAMA, T ;

HIROSHIMA, H ;

TANOUE, H .

APPLIED PHYSICS LETTERS, 1983, 42 (10) :908-910

[4] FET FABRICATION USING MASKLESS ION-IMPLANTATION [J].

KUBENA, RL ;

ANDERSON, CL ;

SELIGER, RL ;

JULLENS, RA ;

STEVENS, EH ;

LAGNADO, I .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :916-920

[5]

LAWSON JD, 1978, PHYSICS CHARGED PART, P199

[6]

SELIGER RL, 1979, APPL PHYS LETT, V35, P863

[7]

SEPTIER A, 1967, FOCUSING CHARGED PAR, V2, P150

[8]

STANGL G, 1983, MICROCIRCUITS ENG 83

[9] A MONTE-CARLO CALCULATION OF THE VIRTUAL SOURCE SIZE FOR A LIQUID-METAL ION-SOURCE [J].

WARD, JW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :207-213

← 1 →