CRYSTAL AND DOMAIN-STRUCTURES IN SPUTTERED NI-51.6 AT-PERCENT TI SHAPE-MEMORY ALLOY-FILMS

被引：5

作者：

GONG, FF

SHEN, GJ

SHEN, HM

WANG, YN

机构：

[1] SE UNIV,CTR ANAL & TEST,NANJING 210018,PEOPLES R CHINA

[2] NANJING UNIV,DEPT PHYS,NANJING 210008,PEOPLES R CHINA

来源：

MATERIALS LETTERS | 1995年 / 23卷 / 1-3期

关键词：

D O I：

10.1016/0167-577X(95)00014-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A new crystalline phase in sputtered Ni-51.6 at% Ti thin films crystallized at 550 degrees C for 0.5 h was discovered. Its crystal structure was determined by XRD and SAED patterns to be orthorhombic with a B-face centered cell. The lattice parameters are a=b=4.250 Angstrom and c=3.005 Angstrom and the structure belongs to space group Bmmm (D-2n(19)). Its 90 degrees domain structure was also established.

引用

页码：87 / 91

页数：5

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