MECHANISM OF POLYSILAZANE THIN-FILM FORMATION DURING GLOW-DISCHARGE POLYMERIZATION OF HEXAMETHYLCYCLOTRISILAZANE

被引：37

作者：

WROBEL, AM ^{[1
]}

KRYSZEWSKI, M ^{[1
]}

GAZICKI, M ^{[1
]}

机构：

[1] POLISH ACAD SCI,CTR MOLEC & MACROMOLEC STUDIES,LODZ 40,POLAND

来源：

POLYMER | 1976年 / 17卷 / 08期

关键词：

D O I：

10.1016/0032-3861(76)90206-8

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：673 / 677

页数：5

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