KINETIC-STUDIES ON THE DISSOLUTION BEHAVIOR OF ANODIC OXIDE-FILMS ON ALUMINUM IN KF-SOLUTIONS

A study was made to account for the dissolution of naturally developed and anodically formed oxide films on aluminum in KF solutions. The behavior of these oxide films was investigated by impedance and potential measurements. In general, oxide dissolution follows an empirical relation expressed by a formula incorporating oxide film thickness. The dissolution behavior indicates that the oxide is of a duplex nature; the inner layer undergoes dissolution more freely than the outer layer. The oxide dissolves at a rate independent of thickness, following zero-order kinetics.