GRATING-COUPLED LIGHT-EMISSION FROM THE SLOW MODE OF METAL-INSULATOR-METAL TUNNEL-JUNCTIONS

被引:15
作者
USHIODA, S
UEHARA, Y
TAKADA, M
OTSUBO, K
MUROTA, J
机构
[1] Research Institute of Electrical Communication, Tohoku University, Katahira, Aoba-ku, Sendai
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1992年 / 31卷 / 7A期
关键词
ULTRA-FINE GRATING; ELECTRON BEAM LITHOGRAPHY; LIGHT EMITTING TUNNEL JUNCTION; SURFACE PLASMON; SI;
D O I
10.1143/JJAP.31.L870
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have observed the direct light emission from the slow mode of surface plasmon polaritons (SPP) of metal-insulator-metal (MIM) tunnel junctions formed on a ultra-fine grating. The grating (period = 100 nm, groove depth = 12 nm, area = 200-mu-m x 200-mu-m) was created on a Si(100) wafer, using a direct electron beam lithography technique and wet etching of SiO2 The MIM junction was formed by evaporation of Al and Au films on this grating. The emission peak for the Al-Oxide-Au junction was observed at 1.55 eV that is expected from the dispersion curve of the slow mode. The spectral width is appreciably narrower than the emission due to the natural residual micro-roughness of the junction.
引用
收藏
页码:L870 / L873
页数:4
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