NEW METAL-RICH GERMANIDE AND CARBIDE NON-CRYSTALLINE SOLIDS

被引:12
作者
MESSIER, R [1 ]
SARKAR, AK [1 ]
ROY, R [1 ]
机构
[1] PENN STATE UNIV,MAT RES LAB,UNIVERSITY PK,PA 16802
关键词
D O I
10.1016/0025-5408(74)90195-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:157 / 166
页数:10
相关论文
共 25 条
[1]   SUPERCONDUCTING PROPERTIES OF REACTIVELY SPUTTERED THIN-FILM TERNARY NITRIDES NB-TI-N AND NB-ZR-N [J].
BELL, H ;
SHY, YM ;
ANDERSON, DE ;
TOTH, LE .
JOURNAL OF APPLIED PHYSICS, 1968, 39 (06) :2797-&
[2]   AMORPHOUS METALLIC FILMS FOR BUBBLE DOMAIN APPLICATIONS [J].
CHAUDHARI, P ;
CUOMO, JJ ;
GAMBINO, RJ .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1973, 17 (01) :66-68
[3]  
COLBY JW, 1968, ADV XRAY ANALYSIS, V2
[4]   HOPPING CONDUCTION IN GE-CR AMORPHOUS THIN-FILMS [J].
DAVER, H ;
CHAKRAVERTY, BK ;
MASSENET, O .
SOLID STATE COMMUNICATIONS, 1972, 11 (01) :131-+
[5]  
DUWEZ P, 1963, T METALL SOC AIME, V227, P362
[6]   RADIO-FREQUENCY-SPUTTERED FILMS OF BETA-TUNGSTEN STRUCTURE COMPOUNDSS [J].
HANAK, JJ ;
GITTLEMAN, JI ;
PELLICANE, JP ;
BOZOWSKI, S .
JOURNAL OF APPLIED PHYSICS, 1970, 41 (12) :4958-+
[7]   CALCULATION OF DEPOSITION PROFILES AND COMPOSITIONAL ANALYSIS OF COSPUTTERED FILMS [J].
HANAK, JJ ;
WEHNER, RK ;
LEHMANN, HW .
JOURNAL OF APPLIED PHYSICS, 1972, 43 (04) :1666-&
[8]   REACTIVELY SPUTTERED TANTALUM THIN FILM RESISTORS .1. PHYSICAL AND ELECTRICAL PROPERTIES [J].
HARDY, WR ;
SHEWCHUN, J ;
KUENZIG, D ;
TAM, C .
THIN SOLID FILMS, 1971, 8 (02) :81-&
[9]  
HARROP PJ, 1967, THIN SOLID FILMS, V1, P475
[10]   LOCALIZED AND NONLOCALIZED IMPURITY STATES IN AMORPHOUS GERMANIUM [J].
HAUSER, JJ .
SOLID STATE COMMUNICATIONS, 1973, 13 (09) :1451-1454