X-RAY-DIFFRACTION CHARACTERIZATION OF STRESS AND CRYSTALLOGRAPHIC TEXTURE IN THIN-FILM MEDIA

被引:15
作者
BAIN, JA
CLEMENS, BM
BRENNAN, SM
KATAOKA, H
机构
[1] STANFORD SYNCHROTRON RADIAT LAB,STANFORD,CA 94309
[2] HITACHI CORP,PRODUCT ENGN RES LAB,YOKOHAMA,JAPAN
基金
美国国家科学基金会;
关键词
D O I
10.1109/20.195586
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
X-ray diffraction has been used to measure the stress and the in-plane crystallographic texture of Co alloy films on grooved substrates. The preference for the c-axis to lie parallel to the groove direction has been quantified. A small in-plane stress was measured which displayed an anisotropy between the two directions. The magnitude of this stress appears to be large enough (according to a simple calculation) to contribute to observed coercive anisotropies. The techniques used for extracting the in-plane crystallographic texture and the value of the in-plane stress from the x-ray measurements are discussed.
引用
收藏
页码:300 / 306
页数:7
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