LOW-PRESSURE GAIN MEASUREMENTS IN KRF

被引：12

作者：

HIRST, GJ

SHAW, MJ

机构：

[1] Rutherford Appleton Laboratory, Chilton, Dicot

来源：

APPLIED PHYSICS B-PHOTOPHYSICS AND LASER CHEMISTRY | 1991年 / 52卷 / 05期

关键词：

D O I：

10.1007/BF00325491

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Optical gain at 248 nm is measured in low pressure krypton/fluorine mixtures excited by an electron-beam. Measurable gain is observed down to a pressure of 50 mbar. Results are compared with the predictions of a simple kinetic model. The application of low pressure operation to ultra high power short pulse amplifiers is discussed.

引用

页码：331 / 335

页数：5

共 22 条

[1] HIGH-ENERGY AMPLIFICATION OF PICOSECOND PULSES AT 248 NM [J].