THE INTERACTION OF HYDROGEN WITH SILICON SURFACES - A FIELD-ION MICROSCOPE AND PULSED-LASER ATOM-PROBE STUDY

被引：7

作者：

KELLOGG, GL

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1983年 / 1卷 / 02期

关键词：

D O I：

10.1116/1.572349

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1125 / 1129

页数：5

共 22 条

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[7] DETERMINING THE FIELD EMITTER TEMPERATURE DURING LASER IRRADIATION IN THE PULSED LASER ATOM PROBE
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[J]. SURFACE SCIENCE, 1982, 120 (02) : 319 - 333
[9] PULSED-LASER ATOM-PROBE FIELD-ION MICROSCOPY
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[10] KELLOGG GL, SURF SCI