A SUBSTRATE HEATER DESIGN FOR HIGH-TEMPERATURE DEPOSITION IN AN OXIDIZING PLASMA

被引：9

作者：

INAMETI, EE

RAVEN, MS

WAN, YM

MURRAY, BG

机构：

[1] Department of Electrical, Electronic Engineering University of Nottingham, Nottingham

来源：

VACUUM | 1992年 / 43卷 / 1-2期

关键词：

D O I：

10.1016/0042-207X(92)90196-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A novel contact heater which can operate reliably in air, vacuum and highly oxidizing atmospheres has been designed and constructed. It uses a fully enclosed element which makes good thermal contact with a stainless steel plate on which the substrates are clamped. Adequate radiation shields are used to reduce heat loss. Power consumption is less than 200 W for an operational temperature of 750-degrees-C.

引用

页码：121 / 123

页数：3

共 4 条

[1] A VERSATILE SUBSTRATE HEATER FOR USE IN HIGHLY OXIDIZING ATMOSPHERES [J].