INFLUENCE OF DILUTION IN NITROGEN ON THE PHOTODISSOCIATION PROCESSES OF SILANE AND DISILANE AT 193-NM

被引：3

作者：

BOCH, E

FUCHS, C

FOGARASSY, E

SIFFERT, P

机构：

来源：

APPLIED SURFACE SCIENCE | 1989年 / 43卷

关键词：

D O I：

10.1016/0169-4332(89)90184-0

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：17 / 22

页数：6

共 16 条

[1] RATE CONSTANTS FOR REACTIONS OF HYDROGEN-ATOMS WITH SOME SILANES AND GERMANES [J].

AUSTIN, ER ;

LAMPE, FW .

JOURNAL OF PHYSICAL CHEMISTRY, 1977, 81 (12) :1134-1138

[2] THE 147-NM PHOTOLYSIS OF PHOSPHINE-SILANE MIXTURES [J].

BLAZEJOWSKI, J ;

LAMPE, FW .

JOURNAL OF PHOTOCHEMISTRY, 1981, 16 (02) :105-120

[3]

BOCH E, 1988, 8TH PHOT SOL EN C FL

[4] A MATHEMATICAL-MODEL OF THE COUPLED FLUID-MECHANICS AND CHEMICAL-KINETICS IN A CHEMICAL VAPOR-DEPOSITION REACTOR [J].

COLTRIN, ME ;

KEE, RJ ;

MILLER, JA .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (02) :425-434

[5] REACTIONS OF HYDROGEN AND DEUTERIUM WITH SILANE AND MONOMETHYLSILANES, DIMETHYLSILANES, AND TRIMETHYLSILANES AT ROOM-TEMPERATURE [J].

COWFER, JA ;

LYNCH, KP ;

MICHAEL, JV .

JOURNAL OF PHYSICAL CHEMISTRY, 1975, 79 (12) :1139-1147

[6] REACTIONS OF SIH2(X1A1) WITH H-2, CH4, C2H4, SIH4 AND SI2H6 AT 298-K [J].

INOUE, G ;

SUZUKI, M .

CHEMICAL PHYSICS LETTERS, 1985, 122 (04) :361-364

[7]

JASNIKI JM, 1988, J CHEM PHYS, V88, P1678

[8] ARRHENIUS PARAMETERS FOR SILENE INSERTION REACTIONS [J].

JOHN, P ;

PURNELL, JH .

JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS I, 1973, 69 (08) :1455-1461

[9] RATE CONSTANTS FOR REACTION OF HYDROGEN AND DEUTERIUM ATOMS WITH SILANE [J].

MIHELCIC, D ;

SCHUBERT, V ;

SCHINDLER, RN ;

POTZINGER, P .

JOURNAL OF PHYSICAL CHEMISTRY, 1977, 81 (16) :1543-1545

[10]

MIHELCIC D, 1974, Z PHYS CHEM, V78, P820

← 1 2 →